SMT-08 Gas Controls CD.ppt
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1、 2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Quirk and Julian SerdaSemiconductor Semiconductor Manufacturing TechnologyManufacturing TechnologyMichael Quirk&Julian Serda Michael Quirk&Julian Serda October 2001 by Prentice HallOctober 2001 by Prentice HallChapter 8Chapter 8
2、Gas Control Gas Control in Process Chambersin Process Chambers 2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Quirk and Julian SerdaObjectivesAfter studying the material in this chapter,you will be able to:1.Explain why process chambers are used in semiconductor manufacturing.
3、2.Describe the benefits of vacuum,the vacuum ranges and appropriate pumps.3.Explain the need for gas flow in process chambers and how it is controlled.4.Explain what is an RGA and why it is beneficial in process chambers.5.Describe what is a plasma and how it is obtained.6.Discuss the effects of con
4、tamination in chambers and how to minimize it.2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Quirk and Julian SerdaThe Many Functions of Process ChambersControlling how gas chemicals flow into and react in the chamber in close proximity to the wafer.Creating a vacuum environme
5、nt.Removing undesirable moisture,air and reaction by-products.Creating an environment for chemical reactions such as plasma to occur.Controlling the heating and cooling of the wafer.2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Quirk and Julian SerdaEarly 1960s Vacuum Bell Ja
6、rBell jarIsolation valveGas moleculesVacuum pumpExhaustFigure 8.1 2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Quirk and Julian SerdaIntegrated Cluster ToolProcess chamberWafer orienterWafer handlerCooldown chamberLoad/unload stationsUsed with permission from Applied Materia
7、ls,Inc.,Endura PECVD systemFigure 8.2 2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Quirk and Julian SerdaVacuumBenefits of VacuumVacuum RangesMean Free Path 2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Quirk and Julian SerdaBenefits of Vacuum in Semi
8、conductor ManufacturingTable 8.1 2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Quirk and Julian SerdaVacuum RangesTable 8.2 2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Quirk and Julian SerdaMean Free Path and Molecular Density Versus PressureTable 8.
9、3 2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Quirk and Julian SerdaVacuum PumpsRoughing PumpDry Mechanical PumpBlower/Booster PumpHigh Vacuum PumpTurbomolecular PumpCryopumpVacuum in Integrated Tools 2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Qui
10、rk and Julian SerdaRoughing Pump Exhausting a High Vacuum PumpRoughingpumpHi-vac valveHi-vac pumpProcess chamberFigure 8.3 2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Quirk and Julian SerdaRotary Claw Dry Mechanical PumpExhaust portCompressed gasesRotorsIntake PortStator ho
11、using(a)(b)(c)Used with permission from International SEMATECHFigure 8.4 2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Quirk and Julian SerdaRoots Blower PumpPump outlet to roughing pumpPump inlet connected to process chamberLobes rotate rapidly in opposite directions forcing
12、 gas through the outlet.Figure 8.5 2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Quirk and Julian SerdaTurbo Pump BladesRotorStatorMotorOutletInletStatorStator joinedto pump housingRotorUsed with permission from Varian Vacuum SystemsFigure 8.6 2001 by Prentice HallSemiconduct
13、or Manufacturing Technologyby Michael Quirk and Julian SerdaCryopump Compressor and Pump Module Cryopump housing Cold head Gas linesOutlet to roughing pumpInlet to process chamberCompressorUsed with permission from Varian Vacuum SystemsFigure 8.7 2001 by Prentice HallSemiconductor Manufacturing Tech
14、nologyby Michael Quirk and Julian SerdaCryoarray Surfaces in Pump ModuleFirst-stage cryoarraySecond-stage cryoarrayH2O vaporN2,O2,ArH2,He,NeUsed with permission from Varian Vacuum Systems Figure 8.8 2001 by Prentice HallSemiconductor Manufacturing Technologyby Michael Quirk and Julian SerdaCluster T
15、ool Layout with Vacuum EnvironmentWafer orienter Medium vacuumWafer cassette loadlocksAtmosphere to medium vacuumEtch process chambersMedium to high vacuumTurbo pump preceded by a mechanical forepumpWafer transfer chamber Medium vacuum Mechanical roughing pump Figure 8.9 2001 by Prentice HallSemicon
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